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193nm Lithography: Surprising Innovations from Lincoln Lab
- 2025/04/14
- 再生時間： 2 時間 8 分
- ポッドキャスト
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サマリー
あらすじ・解説
In this episode of the 632nm podcast, we explore how 193nm lasers unexpectedly overtook x-ray approaches and reshaped semiconductor manufacturing. Our guest describes the breakthroughs that turned a once “impossible” technology into the mainstay of chip fabrication, including the discovery of specialized lenses, the invention of chemically amplified resists, and the game-changing flip to immersion lithography. We also hear candid insights on the race to push below 13.5 nanometers, where new ideas in plasma sources and advanced coatings might one day carry Moore’s Law even further.
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Xinghui Yin: https://x.com/XinghuiYin
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